OBJECTIVE To determine of content of fentanyl citrate in the film preparation. METHODS RP-HPLC method was adopted. 目的建立测定膜剂中枸橼酸芬太尼含量的方法。
Film preparation conditions, film surface morphology and structure of the two kinds of materials are summarized. 总结了这两类材料的成膜条件、薄膜表面形态和结构以及它们的敏感特性。
Research on ZnO: N Film Preparation and Its Optical Property by Radio Frequency Magnetron Sputtering 磁控溅射法制备氮掺杂ZnO薄膜及其光学特性研究
A novel process combining the self-assembly technique with electron beam lithography and selective chemical deposition was proposed for patterned film preparation. 本文提出了一种新颖的结合自组装技术和电子束直写曝光以及选择性化学沉积制备图案化薄膜方法。
Synthesis and Properties of the Fluoro Modified Pu Based Hydrophobic Film Preparation and performance test of two-package water-borne fluorine acrylic/ polyurethane coatings 氟改性聚氨酯基复合疏水性涂料的制备及性能研究水性双组分氟丙烯酸&聚氨酯涂料的研制及性能测试
Al-doped zinc oxide thin film preparation and integration mechanism 掺铝氧化锌(AZO)薄膜制备及结合机理探索
Review on current methods of SiO_2 thin film preparation SiO2薄膜制备的现行方法综述
With the aid in test methods and so on XRD, SEM, Research nanometer zinc oxide thin film preparation condition, field emission performance and stability. 借助于XRD、SEM等测试手段,对锥状纳米氧化锌薄膜的制备条件、场发射特性和稳定性分析研究。
The material choosing and coating designing are discussed in this paper. At the same time, several methods for laser reflective film preparation are compared. 分析了高阈值激光反射膜膜层材料的选择及膜系设计,比较了目前制备高阈值激光反射膜的几种常用方法。
These experimental results are valuable for numerical analysis on interactions between droplets and substrate during PZT film preparation in electrostatic spray deposition ( ESD) system. 这些结果为溶胶电雾化系统中薄膜沉积过程的理论研究提供了实验依据。
Controlling Liquid Source System with Ferroelectric Thin Film Preparation by Using PLC 采用PLC控制制备铁电薄膜的液态源系统
The Film Preparation of Amorphous and Crystalline Ti-Ni Hydrogen Storage Alloys by Ion Beam Sputtering 离子束溅射法制备非晶态和晶态Ti-Nj贮氢薄膜合金
Al_2O_ 3 Film Preparation on Porous Stainless Steel by Sol-Gel Method 以溶胶-凝胶法在多孔不锈钢基体上附载Al2O3膜
Principle and Features of ASSP Method a New Process of Ceramic Thin Film Preparation 陶瓷膜制备新工艺&ASSP法的基本原理和特点
Technology Study of Unmelting metals and Silicide Film Preparation 难熔金属及硅化物薄膜制备技术研究
The third chapter expatiates on the film preparation and the influence of annealing condition on film microstructure, chemical composition and photoelectrical properties. 第三章详述了ITO透明导电薄膜的制备和热处理条件对其微结构、化学组分及其光电特性的影响;
TiO_2 is often used as high refractive index material in optical thin film preparation. 在光学薄膜制备中,TiO2是常用的高折射率材料。
Several advances in VO2 thin film preparation are discussed, with focus on heat treatment conditions. Some latest applications are reviewed. 综述了VO2薄膜的制备工艺,着重探讨了热处理工艺和条件对其性能的影响,并介绍了它的最新应用情况。
Vacuum Sintering of Ag& MgF_2 Cermet for Film Preparation 膜用Ag-MgF2金属陶瓷体的真空烧结
A Study on Film Preparation of ZnO and Mixing Technology of Al ZnO薄膜的制备及其Al掺杂工艺的初步探讨
The Design and Fabrication of a Multipurpose Thin Film Preparation System 多功能薄膜制备系统的设计与制作
Nanometer multilayer complex TiN/ Cu film preparation by multi-arc ion plating 多弧离子镀TiN/Cu多层复合纳米膜研究
The relationship between the sintering conditions and the microstructure of Ag-MgF 2 cermet for film preparation was studied. 本文报道了Ag-MgF2金属陶瓷体的烧结条件与微观结构之间的关系。
In order to enhance the reliability and repeatability of the ferroelectric thin film preparation, the liquid source MOCVD system is designed based on PLC. 为了提高制备铁电薄膜的可靠性和重复性,设计了基于PLC控制的液态源MOCVD系统。
A brief overview of U film preparation methods is given. 探讨了U薄膜的制备方法。
A review is presented of the pioneering works of Gruen et al. on nano-diamond film preparation in a hydrogen depleted environment, and comparisons are made with nano-diamond films deposited in a hydrogen-rich environment. 文章重点介绍了Gruen等人在贫氢和无氢环境中制备纳米金刚石膜的开创性工作,并和在富氢气氛中制备的纳米金刚石膜进行了对比评述。
Photochemical vapor deposition and its application in film preparation 光化学汽相淀积技术在薄膜备制中的应用
At home and abroad the mainstream film preparation of InN has MOCVD, MBE, HVPE, magnetron sputtering technique. 目前国内外制备InN薄膜的主流工艺有MOCVD、MBE、HVPE、磁控溅射技术。
Based on the TaN film preparation, the structure parameters and the micro-wave properties of TaN micro-wave power resistors were designed and simulated by HFSS software, respectively. 在此基础上,采用HFSS软件设计、仿真了TaN薄膜微波功率电阻器的性能及结构参数。
We studied mainly on the following several aspects. ( 1) Define the annealing temperature in the composite film preparation technique. 主要探讨了以下几个方面的内容。(1)复合介质膜制备工艺中退火温度的确定。